Santa Clara, CA, United States of America

Li-Quan Xia

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Li-Quan Xia. Retrieved from https://idiyas.com/inventor/li-quan-xia

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations of Li-Quan Xia in Integrated Circuit Fabrication

Introduction

Li-Quan Xia is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of integrated circuit fabrication. He is recognized for his innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Li-Quan Xia holds a patent titled "Methods and apparatus for e-beam treatment used to fabricate integrated circuit devices." This patent describes a method for fabricating a low-k dielectric film, which includes steps such as chemical vapor depositing a lower-k dielectric film and e-beam treating the lower-k dielectric film. His work in this area has the potential to improve the performance of integrated circuits significantly.

Career Highlights

Li-Quan Xia is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role at the company allows him to apply his expertise in developing advanced technologies that drive innovation in integrated circuit manufacturing.

Collaborations

Throughout his career, Li-Quan Xia has collaborated with esteemed colleagues, including Farhad K Moghadam and Jun Zhao. These collaborations have fostered a productive environment for innovation and have contributed to the advancement of technologies in the semiconductor field.

Conclusion

Li-Quan Xia's contributions to integrated circuit fabrication through his innovative patent and work at Applied Materials, Inc. highlight his importance in the field. His efforts continue to shape the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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