The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Jan. 28, 2005
Applicants:
Farhad Moghadam, Saratoga, CA (US);
Jun Zhao, Cupertino, CA (US);
Timothy Weidman, Sunnyvale, CA (US);
Rick J. Roberts, Sunnyvale, CA (US);
Li-quan Xia, Santa Clara, CA (US);
Alexandros T. Demos, Fremont, CA (US);
Inventors:
Farhad Moghadam, Saratoga, CA (US);
Jun Zhao, Cupertino, CA (US);
Timothy Weidman, Sunnyvale, CA (US);
Rick J. Roberts, Sunnyvale, CA (US);
Li-Quan Xia, Santa Clara, CA (US);
Alexandros T. Demos, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract
One embodiment of the present invention is a method for fabricating a low-k dielectric film that included steps of: (a) chemical vapor depositing a lower-k dielectric film; and (b) e-beam treating the lower-k dielectric film.