Company Filing History:
Years Active: 2019-2025
Title: Innovations of Li-Po Yang in Photoresist Technology.
Introduction
Li-Po Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photoresist technology, particularly in the semiconductor industry. With a total of 5 patents to his name, Yang's work has been instrumental in advancing the methods used in the fabrication of integrated circuits.
Latest Patents
One of Li-Po Yang's latest patents focuses on a photoresist composition and method of forming a photoresist pattern. This method involves forming a photoresist layer over a substrate and selectively exposing it to actinic radiation to create a latent pattern. The latent pattern is then developed by applying a developer to form the final pattern. The photoresist composition includes various polymers and functional groups that enhance its performance in semiconductor applications.
Career Highlights
Li-Po Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in photoresist technology has positioned him as a key player in the development of advanced manufacturing processes.
Collaborations
Throughout his career, Yang has collaborated with notable colleagues, including Wei-Han Lai and Ching-Yu Chang. These collaborations have further enriched his research and development efforts in the field.
Conclusion
Li-Po Yang's innovative work in photoresist technology continues to impact the semiconductor industry significantly. His contributions are vital for the advancement of manufacturing techniques in this rapidly evolving field.