Li-Ming Wang

Title: Innovations of Li-Ming Wang

Introduction

Li-Ming Wang is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving optical proximity correction methods and enhancing the uniformity of photoresist coatings.

Latest Patents

One of his latest patents is a method for optical proximity correction (OPC). This method involves establishing an OPC model and performing a correction step to adjust segments of a layout pattern. The process includes defining an edge of the layout pattern near a hot-spot location on a mask to identify a target point and a dissection point. The method also sets multiple pre-target and pre-dissection points, allowing for the selection of the most suitable points based on image quality.

Another significant patent by Wang is a method for providing uniform photoresist coatings. This technique ensures a consistent coating of photoresist over substrates, which is crucial for defining high-density integrated device and circuit patterns. The method involves applying photoresist in multiple dispensing steps and leveling spins to achieve the desired thickness uniformly, even on substrates with high topographic surfaces.

Career Highlights

Li-Ming Wang is currently employed at Vanguard International Semiconductor Corporation, where he continues to innovate in semiconductor technologies. His expertise in optical proximity correction and photoresist applications has positioned him as a valuable asset in the industry.

Collaborations

Wang has collaborated with several talented individuals, including Gwo-Yuh Shiau and Shinn-Jhy Lian, who contribute to the advancements in their field.

Conclusion

Li-Ming Wang's contributions to semiconductor technology through his innovative patents demonstrate his commitment to enhancing manufacturing processes. His work continues to influence the industry positively.