This inventor holds 1 USPTO granted patent. Top assignee: Hong Kong Applied Science and Technology Research Institute. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Innovations by Li Min Lin in Vertical LED Structures
Introduction
Li Min Lin is an accomplished inventor based in Hong Kong, CN. He has made significant contributions to the field of vertical LED structures, focusing on optimizing the design of polishing stops. His innovative approach has the potential to enhance the efficiency and cost-effectiveness of LED production.
Latest Patents
Li Min Lin holds a patent for the "Optimization of polishing stop design." This invention provides a method for fabricating vertical LED structures by removing the substrate used for epitaxial layer growth through polishing. The technique employs chemical mechanical polishing with polish stops, ensuring a sufficiently level plane. The polish stops are integrated into the multilayer structure before the polishing process, utilizing materials that are harder than the substrate being removed. This method allows for the production of vertical GaN LEDs at a lower cost and with higher yield compared to traditional methods such as laser lift-off or conventional polishing. The polish stops can be removed using saw dicing, laser dicing, or plasma etching.
Career Highlights
Li Min Lin is affiliated with the Hong Kong Applied Science and Technology Research Institute, where he continues to advance research in LED technology. His work has garnered attention for its practical applications in the electronics industry.
Collaborations
Li Min Lin collaborates with notable colleagues, including Ka Wah Chan and Yong Cai, who contribute to the research and development of innovative technologies in the field.
Conclusion
Li Min Lin's contributions to the optimization of polishing stop design represent a significant advancement in the production of vertical LEDs. His innovative methods promise to improve manufacturing processes and reduce costs in the LED industry.