Kaohsiung, Taiwan

Li-Kang Wu

This inventor holds 1 USPTO granted patent. Top assignee: Chung Yuan Christian University. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Li-Kang Wu. Retrieved from https://idiyas.com/inventor/li-kang-wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations of Li-Kang Wu in Non-Volatile Memory Fabrication

Introduction

Li-Kang Wu is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of non-volatile memory technology. His innovative approach has led to the development of a unique process that enhances the reliability and efficiency of memory devices.

Latest Patents

Li-Kang Wu holds a patent for a process titled "Process for fabricating non-volatile memory by tilt-angle ion implantation." This process involves several critical steps, including the implantation of heterogeneous elements such as Ge, Si, N2, and O2 within a nitride dielectric layer. These elements form traps that capture electrons, preventing them from binding together over time. The process also includes etching the original oxide layers to minimize structural damage and depositing an oxide gate interstitial wall to reduce electron loss, thereby improving device reliability.

Career Highlights

Li-Kang Wu is affiliated with Chung Yuan Christian University, where he continues to advance research in memory technology. His work has garnered attention for its innovative approach to solving challenges in non-volatile memory fabrication.

Collaborations

Li-Kang Wu has collaborated with several esteemed colleagues, including Erik S. Jeng and Wu-Ching Chou, who contribute to the research and development of advanced memory technologies.

Conclusion

Li-Kang Wu's contributions to the field of non-volatile memory fabrication demonstrate his innovative spirit and commitment to advancing technology. His patented process represents a significant step forward in enhancing the reliability of memory devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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