Company Filing History:
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Years Active: 2013-2024
Title: Innovations by Inventor Li-Hsin Wang
Introduction
Li-Hsin Wang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of photolithography, particularly in the development of technologies aimed at improving the efficiency of mask cleaning processes. With a total of 5 patents to his name, Wang's work has garnered attention in both academic and industrial circles.
Latest Patents
One of Wang's latest patents is titled "Particle Removing Assembly and Method of Cleaning Mask for Lithography." This innovative photolithographic apparatus includes a particle removing cassette, a pump, and a compressor. The particle removing cassette features a first slit with an array of parallel wind blade nozzles that are designed to eject and direct pressurized cleaning material onto the patterning surface of a mask. This process effectively removes debris particles from the surface. The pump and compressor are controlled by a controller that adjusts the flow rate and pressure of the cleaning material based on the amount of debris present.
Another notable patent by Wang is also titled "Particle Removing Assembly and Method of Cleaning Mask for Lithography." This version of the apparatus includes a particle removing cassette that can be selectively extended from the processing apparatus. It features a wind blade slit that directs pressurized cleaning material to the mask surface, while an exhausting slit collects the separated debris particles and contaminants through an exhaust line. In various embodiments, both the wind blade slit and the exhausting slit contain arrays of nozzles and exhaust lines, respectively.
Career Highlights
Li-Hsin Wang has worked with notable organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and National Cheng Kung University. His experience in these institutions has allowed him to refine his skills and contribute to advancements in semiconductor manufacturing technologies.
Collaborations
Wang has collaborated with several professionals in his field, including Chen-Yang Lin and Da-Wei Yu. These collaborations have further enriched his research and development efforts.
Conclusion
Li-Hsin Wang's innovative work in photolithography and mask cleaning technologies has made a significant impact in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes and improving efficiency.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.