Portland, ME, United States of America

Li-Heng Chou

This inventor holds 4 USPTO granted patents. Top assignee: National Semiconductor Corporation. Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Li-Heng Chou. Retrieved from https://idiyas.com/inventor/li-heng-chou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010-2011

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4 patents (USPTO):Explore Patents

Title: The Innovations of Li-Heng Chou

Introduction

Li-Heng Chou is a notable inventor based in Portland, ME (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is titled "Method and system for scaling channel length." This invention provides a method for scaling channel length in a semiconductor device by increasing a pitch to reduce a development inspection critical dimension (DICD) for a plurality of polysilicon lines. The polysilicon lines are then trimmed to achieve a reduced-size channel length based on the reduced DICD. In a particular embodiment, the semiconductor device is fabricated using a photolithography tool with a wavelength of 248 nm, where the pitch is approximately 800 nm, and the reduced-size channel length is about 0.11 µm.

Another significant patent is the "Photo-focus modulation method for forming transistor gates and related transistor devices." This method involves performing a first exposure of a photo-resist material on a semiconductor device to define a line pattern. A second exposure is then performed to trim the resist profile of the line pattern. The etching of a conductive material on the semiconductor device forms a transistor gate based on the line pattern. This innovative approach allows for a thicker insulating material, such as tetraethylorthosilicate, to be deposited around portions of the transistor gate.

Career Highlights

Li-Heng Chou is currently employed at National Semiconductor Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative approaches have positioned him as a key figure in his field.

Collaborations

Throughout his career, Li-Heng has collaborated with notable colleagues, including Jiankang Bu and Kenneth M. Lewis. These collaborations have further enhanced the impact of his work in semiconductor technology.

Conclusion

Li-Heng Chou's contributions to semiconductor technology through his patents and innovative methods demonstrate his significant role as an inventor. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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