Tainan, Taiwan

Li-De Hsu

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Li-De Hsu

Introduction

Li-De Hsu is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor processing. His innovative approach has led to advancements that enhance the efficiency of wafer etch cleaning processes.

Latest Patents

Li-De Hsu holds a patent for a "Method to improve post wafer etch cleaning process." This invention involves a method and apparatus for performing a semiconductor process wafer drying process. The method provides a semiconductor wafer with a process surface disposed in an enclosed drying space after exposure to water. It includes supplying a solvent vapor to the drying space at a predetermined concentration from a solvent vapor source and at least one solvent vapor supply line. The process also involves determining the solvent vapor concentration and temperature in the drying space and heating components to alter the solvent vapor concentration effectively.

Career Highlights

Li-De Hsu is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor industry. His work has been pivotal in improving semiconductor manufacturing processes, showcasing his expertise and innovative thinking.

Collaborations

Li-De Hsu has collaborated with notable coworkers, including Jia-Ren Chen and Chin-Chia Kuo. Their teamwork has contributed to the successful development of advanced semiconductor technologies.

Conclusion

Li-De Hsu's contributions to semiconductor processing through his innovative patent demonstrate his significant role in the industry. His work continues to influence advancements in technology and manufacturing processes.

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