This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Li Chung Yu - Innovator in Semiconductor Technology
Introduction
Li Chung Yu is a talented inventor based in Kaohsiung, Taiwan. She has made significant contributions to the field of semiconductor technology. Although she currently holds no granted patents, her innovative ideas are reflected in her latest patent applications.
Latest Patent Applications
Li Chung Yu's recent patent applications include advancements in Metal-Insulator-Metal Capacitors and methods of forming the same. This application describes semiconductor structures and methods that involve depositing a first conductive material layer over a substrate. The process includes patterning the first conductive material layer to create a first conductor plate, followed by the formation of multiple high-K dielectric layers. The composition of these layers is carefully designed to enhance the performance of the capacitors.
Another notable application is for a VIA with a sacrificial stress barrier ring. This interconnect structure on a semiconductor die consists of a lower conductive layer and an upper conductive layer, with a VIA positioned between them. The VIA features a primary interconnect structure surrounded by a sacrificial stress barrier ring, which is crucial for maintaining structural integrity during fabrication.
Conclusion
Li Chung Yu is an innovative inventor whose work in semiconductor technology showcases her potential to contribute significantly to the field. Her latest patent applications reflect her commitment to advancing technology and improving semiconductor structures.