Li-Chi Chao

Title: Innovations of Li-Chi Chao

Introduction

Li-Chi Chao is a notable inventor based in Yang Mei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 2 patents, Chao has demonstrated his expertise in developing advanced processes for etching and cavity formation.

Latest Patents

One of his latest patents is titled "Film stack and etching sequence for dual damascene." This patent describes a process for forming a dual damascene cavity in a dielectric, specifically a low k organic dielectric. The dielectric consists of two layers separated by an etch stop layer. The formation of the damascene cavity is achieved using a hard mask made of two layers of silicon oxynitride separated by a layer of silicon oxide. The method ensures minimal misalignment during the patterning process due to the thin upper layer. Additional etching steps lead to the completion of the cavity and trench part, with a final etch step finishing the process without damaging the organic dielectric.

Another significant patent by Chao is the "Edge defect inhibited trench etch plasma etch method." This method involves etching a trench within a silicon oxide layer using a plasma etch method. The process begins with a substrate and a silicon oxide layer, followed by a masking layer. The plasma etch method employs a specific etchant gas composition, which includes octafluorocyclobutane and other gases, while excluding carbon and oxygen-containing gases. This innovative approach enhances the precision of trench etching.

Career Highlights

Li-Chi Chao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on developing advanced etching techniques that are crucial for the manufacturing of integrated circuits. Chao's contributions have been instrumental in improving the efficiency and effectiveness of semiconductor fabrication processes.

Collaborations

Chao has collaborated with several talented individuals in his field, including Jen-Cheng Liu and Chao-Cheng Chen. These collaborations have fostered a productive environment for innovation and have led to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Li-Chi Chao's innovative patents and contributions to the semiconductor industry highlight his expertise and commitment to advancing technology. His work continues to influence the field, paving the way for future innovations in semiconductor