York, United Kingdom

Lewis A Binns


Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 66(Granted Patents)


Company Filing History:


Years Active: 2009-2012

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5 patents (USPTO):

Title: **Lewis A Binns: Innovator in Lithographic Measurement Systems**

Introduction

Lewis A Binns, an accomplished inventor based in York, GB, has made significant contributions to the field of lithography and integrated circuits. With a total of five patents to his name, Binns's work has focused on enhancing the precision of measurement systems critical for the production of integrated circuits.

Latest Patents

Among his most recent inventions is the "Multilayer Alignment and Overlay Target and Measurement Method." This innovative target system is designed to determine the positioning error between lithographically produced integrated circuit fields across multiple lithographic levels. The system features two target patterns—one on a lithographic field containing an integrated circuit pattern and another on a different lithographic field. Each target pattern comprises a plurality of symmetric sub-patterns, enabling accurate comparison between their centers to assess positioning errors effectively.

Career Highlights

Throughout his career, Lewis A Binns has held positions at several prominent companies, most notably IBM and Nanometrics Inc. His experiences in these organizations have greatly influenced his research and development efforts, leading to advancements in measurement techniques used in modern lithography.

Collaborations

Binns has had the opportunity to collaborate with notable professionals in his field, including Nigel Peter Smith and Christopher P Ausschnitt. These collaborations have likely contributed to the depth and impact of his inventions, fostering innovation within the lithography domain.

Conclusion

Lewis A Binns stands out as a pivotal inventor in the realm of lithographic technology. His dedication to refining measurement methods is evident through his patents, which continue to emphasize the importance of precision in integrated circuit manufacturing. His contributions not only reflect his expertise but also serve as a foundation for future advancements in the industry.

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