Burghausen, Germany

Lev Kadinski

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: Inventor Lev Kadinski: Pioneering Innovations in Epitaxial Layer Growth

Introduction

Lev Kadinski is a notable inventor based in Burghausen, Germany, recognized for his contributions to the field of chemical vapor deposition (CVD) technology. With a total of two patents to his name, Kadinski's work focuses on improving the efficiency and uniformity of epitaxial layer growth in rotating disk reactors.

Latest Patents

Kadinski's most recent patent, titled "Alkyl Push Flow for Vertical Flow Rotating Disk Reactors," addresses the optimization of gas flow within rotating disk reactors used for growing epitaxial layers. This innovative approach involves directing gas toward substrates at various radial distances, ensuring that both gas flow rate and density remain consistent across all inlets. By incorporating a higher concentration of reactant gas in the flow directed toward the outer portions of the disk, Kadinski guarantees that each part of the substrate receives a uniform amount of reactant gas per unit area. Moreover, the system utilizes a combination of carrier gases with different molecular weights, enabling a linear flow pattern that mitigates laminar recirculation, thereby enhancing the uniform deposition and growth of epitaxial layers.

Career Highlights

Kadinski is associated with Veeco Instruments Inc., a company renowned for its cutting-edge semiconductor manufacturing technology. His expertise and innovative mindset have significantly contributed to advancements in CVD systems, positioning Veeco Instruments as a leader in the industry.

Collaborations

Throughout his career, Lev Kadinski has collaborated with esteemed colleagues, including Michael Murphy and Richard Hoffman. Their collective efforts have fostered a productive environment for innovation, driving forward the development of technologies essential to the semiconductor sector.

Conclusion

Lev Kadinski's innovative spirit and dedication to enhancing epitaxial layer growth through novel reactor designs mark him as a significant figure in the field of chemical vapor deposition. Through his patents and collaborative efforts at Veeco Instruments, Kadinski continues to impact the landscape of semiconductor manufacturing, paving the way for future technologies and advancements.

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