This inventor holds 1 USPTO granted patent. Top assignee: Mattson Technology, Inc. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Leroy Luo - Innovator in Semiconductor Processing
Introduction
Leroy Luo is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of plasma processing techniques.
Latest Patents
Leroy Luo holds a patent titled "Systems and methods for variable mode plasma enhanced processing of semiconductor wafers." This patent describes a variable mode plasma system and method for processing a semiconductor wafer. The modulation of the plasma potential relative to the semiconductor wafer is varied for different process steps. A capacitive shield may be selectively grounded to vary the level of capacitive coupling and modulation of the plasma. Process pressures, gases, and power levels may also be modified for different process steps. Plasma properties can be easily tailored to specific layers and materials being processed on the surface of the wafer. Variable mode processes may be adapted for the removal of photoresist after high-dose ion implant, post metal etch polymer removal, via clean, and other plasma enhanced processes. Leroy Luo has 1 patent to his name.
Career Highlights
Leroy Luo is currently employed at Mattson Technology, Inc., where he continues to develop and refine his innovative techniques in semiconductor processing. His work has been instrumental in advancing the capabilities of plasma processing technologies.
Collaborations
Leroy collaborates with talented individuals in his field, including coworkers Rene George and Stephen E Savas. Their combined expertise contributes to the success of their projects and innovations.
Conclusion
Leroy Luo is a distinguished inventor whose work in semiconductor processing has led to significant advancements in the industry. His innovative patent demonstrates his commitment to improving plasma processing techniques, making him a valuable asset to the field.