Sunnyvale, CA, United States of America

Leonid Baranov


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2010-2015

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2 patents (USPTO):Explore Patents

Title: Innovations of Leonid Baranov

Introduction

Leonid Baranov is an accomplished inventor based in Sunnyvale, California. He holds two patents that showcase his expertise in the field of micro electron lenses and dynamic pattern generation. His work has significantly contributed to advancements in electron beam lithography and related technologies.

Latest Patents

One of Baranov's latest patents is for a "Pillar-supported array of micro electron lenses." This invention features a micro-lens array that includes a base layer on a substrate, with an array of base electrode pads and an insulating border to electrically isolate the pads. The design also incorporates lens holes aligned with the base electrode pads and stacked electrode layers. Another embodiment of this patent details a method for fabricating the micro electron lenses.

His second patent is for a "Dynamic pattern generator with cup-shaped structure." This invention is designed for reflection electron beam lithography and includes conductive pixel pads surrounded by an insulative border. The cup-shaped conductive pixel pads allow for controllable voltage application, enhancing the precision of pattern generation.

Career Highlights

Throughout his career, Leonid Baranov has worked with notable companies such as KLA-Tencor Technologies Corporation and KLA-Tencor Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of electron optics.

Collaborations

Baranov has collaborated with talented individuals such as Yehiel Gotkis and Luca Grella. These partnerships have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Leonid Baranov's contributions to the field of micro electron lenses and dynamic pattern generation highlight his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology and improving processes in electron beam lithography.

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