East Walpole, MA, United States of America

Leonard J Mahoney


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Leonard J Mahoney: Innovator in III-V Based Integrated Circuits

Introduction

Leonard J Mahoney is a notable inventor based in East Walpole, MA (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of III-V based integrated circuits. His innovative work has led to advancements that are crucial for modern electronic devices.

Latest Patents

Leonard J Mahoney holds a patent for a new III-V buffer or passivation material produced by low temperature growth (LTG) of III-V compounds. This material exhibits unique and desirable properties, especially for closely spaced, submicron gate length active III-V semiconductor FET devices, such as HEMTs, MESFETs, and MISFETs. The LTG material is grown under ambient conditions, incorporating an excess of the more volatile III-V species into the grown material. The resulting material is crystalline, highly resistive, relatively insensitive to light, and can be overgrown with high-quality III-V active layers or used as a passivation material to insulate and protect active device structures. He has 1 patent to his name.

Career Highlights

Leonard J Mahoney has had a distinguished career, working at the Massachusetts Institute of Technology. His research and innovations have positioned him as a key figure in the semiconductor industry, contributing to the advancement of technology that impacts various applications.

Collaborations

Throughout his career, Leonard has collaborated with esteemed colleagues, including Chang-Lee Chen and Michael J Manfra. These collaborations have further enhanced the quality and impact of his research.

Conclusion

Leonard J Mahoney's contributions to III-V based integrated circuits demonstrate his commitment to innovation in semiconductor technology. His work continues to influence the field and pave the way for future advancements.

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