Leng Seow Tan

Title: Innovations by Leng Seow Tan in Semiconductor Technology

Introduction

Leng Seow Tan is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He has developed innovative processes that enhance the performance of semiconductor devices, particularly in the formation of shallow junctions.

Latest Patents

One of his significant patents is titled "Dual step source/drain extension junction anneal to reduce the junction depth: multiple-pulse low energy laser anneal coupled with rapid thermal anneal." This patent describes a process for forming semiconductor devices such as MOSFETs or CMOS with shallow junctions in the source/drain extension regions. The process involves several steps, including the removal of sidewall dielectric spacers, a pre-amorphizing implant with Ge or Si ions, and the formation of source/drain extension regions through bion implantation. The innovative use of multiple-pulsed 248 nm KrF excimer laser anneal followed by rapid thermal anneal significantly reduces the sheet resistance of the junctions.

Career Highlights

Leng Seow Tan is associated with Chartered Semiconductor Manufacturing Ltd, where he has made substantial contributions to the field of semiconductor manufacturing. His work has been pivotal in advancing the technology used in modern electronic devices.

Collaborations

He has collaborated with notable colleagues, including Chyiu Hyia Poon and Byung Jin Cho, to further enhance the research and development efforts in semiconductor technology.

Conclusion

Leng Seow Tan's innovative approaches in semiconductor technology, particularly through his patented processes, have made a significant impact on the industry. His work continues to influence the development of advanced semiconductor devices.