Len Y Tsou

Title: The Innovations of Len Y Tsou

Introduction

Len Y Tsou is an accomplished inventor based in Lawrence Township, NJ (US). He has made significant contributions to the field of plasma etching technology. His innovative approach has led to the development of a unique method for optimizing plasma etching operations.

Latest Patents

Len Y Tsou holds a patent for an "Optical emission end point detector." This invention provides a method for determining the optimum time to terminate a plasma etching operation. The process involves monitoring the optical emission intensity of the plasma in a narrow band, which is indicative of the gas phase concentration of a plasma etch product or reactant species. Additionally, the optical emission intensity in a wider band is monitored to account for background emission signals. The etching process is concluded when the monitored signal intensity reaches a predetermined value.

Career Highlights

Len Y Tsou has worked at AT&T Technologies, Inc., where he has applied his expertise in plasma technology. His work has been instrumental in advancing the efficiency and effectiveness of plasma etching processes.

Collaborations

Throughout his career, Len has collaborated with notable colleagues, including Leslie G Jerde and Earl Ryan Lory. These partnerships have contributed to the development of innovative solutions in the field.

Conclusion

Len Y Tsou's contributions to plasma etching technology exemplify the impact of innovation in engineering. His patent for the optical emission end point detector showcases his ability to solve complex problems in the industry.