The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 1985
Filed:
Mar. 29, 1984
Leslie G Jerde, Hopewell Township, Mercer County, NJ (US);
Earl R Lory, Pennington, NJ (US);
Kevin A Muething, Hillsborough Township, Somerset County, NJ (US);
Len Y Tsou, Lawrence Township, Mercer County, NJ (US);
AT&T Technologies, Inc., New York, NY (US);
Abstract
A method for determining the optimum time at which a plasma etching operation should be terminated. The optical emission intensity (S.sub.1) of the plasma in a narrow band centered about a predetermined spectral line, indicative of the gas phase concentration of a plasma etch product or reactant species. The optical emission intensity (S.sub.2) of the plasma in a wide band centered about the predetermined spectral line, indicative of a background emission signal is also monitored. The intensity (S.sub.1L) of the spectral line is then determined in accordance with the equation S.sub.1L =S.sub.1 -k (.alpha.S.sub.2 -S.sub.1). The etching process is terminated when the monitored signal intensity (S.sub.1L) or its time derivative reaches a predetermined value.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile