Leibin Yuan

Title: Leibin Yuan: Innovator in Semiconductor Technology

Introduction

Leibin Yuan is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductors, holding a total of 2 patents. His work focuses on improving semiconductor devices and their manufacturing processes.

Latest Patents

Leibin Yuan's latest patents include innovative designs for semiconductor devices. One of his patents, titled "Semiconductor device having a surface insulating layer and manufacturing method therefor," addresses the technical field of semiconductors. This patent discloses a manufacturing method that involves providing a semiconductor structure with an active region and a gate structure. The method includes forming a surface insulator layer on the gate electrode and a patterned interlayer dielectric layer that covers the surface insulator layer. This innovation aims to reduce leakage current between the conductive contact layer and the gate electrode, thereby enhancing device performance.

Another patent with a similar title also focuses on semiconductor devices and their manufacturing methods. It outlines a similar process to improve the efficiency and reliability of semiconductor structures.

Career Highlights

Leibin Yuan has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Leibin Yuan has collaborated with several professionals in his field, including Xianming Zhang and Ling Tang. These collaborations have contributed to the advancement of semiconductor technologies and innovations.

Conclusion

Leibin Yuan is a key figure in the semiconductor industry, with a focus on enhancing device performance through innovative manufacturing methods. His contributions continue to shape the future of semiconductor technology.