This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: National Institute of Metrology, China. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Lei Pi - Innovator in Nanometer Displacement Measurement
Introduction
Lei Pi is a prominent inventor based in Beijing, China. He has made significant contributions to the field of measurement technology, particularly in the area of nanometer displacement. His innovative work has led to the development of a unique composite measurement system that enhances precision in measuring minute displacements.
Latest Patents
Lei Pi holds a patent for a "Composite measurement system for measuring nanometer displacement." This advanced system comprises several key components, including a light source, a polarization beam splitting prism, and various modules for phase change and interference light collection. The system is designed to accurately measure the displacement of objects at the nanometer scale by analyzing light intensity changes and image variations.
Career Highlights
Lei Pi is affiliated with the National Institute of Metrology, China, where he has been instrumental in advancing measurement technologies. His work has not only contributed to scientific research but has also paved the way for practical applications in various industries. With a focus on precision and accuracy, Lei continues to push the boundaries of measurement science.
Collaborations
Lei Pi collaborates with esteemed colleagues, including Xiangpeng Bu and Fang Wang, who contribute to his research endeavors. Their combined expertise fosters an environment of innovation and discovery, further enhancing the impact of their work in the field of metrology.
Conclusion
In summary, Lei Pi is a distinguished inventor whose contributions to nanometer displacement measurement are noteworthy. His innovative patent and collaboration with talented colleagues underscore his commitment to advancing measurement technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile