Farmington Hills, MI, United States of America

Leela Mohana Reddy Arava

This inventor holds 7 USPTO granted patents and 5 published patent applications. Top assignees: Wayne State University, Friedrich Schiller University Jena. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Leela Mohana Reddy Arava. Retrieved from https://idiyas.com/inventor/leela-mohana-reddy-arava

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 1


Company Filing History:


Years Active: 2021-2026

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7 patents (USPTO):Explore Patents

Title: Innovations by Leela Mohana Reddy Arava

Introduction

Leela Mohana Reddy Arava is an accomplished inventor based in Troy, MI (US). She has made significant contributions to the field of electronic devices through her innovative patent.

Latest Patents

Leela holds a patent for a "Method for fabricating wafer scale/nano submicron gap electrodes and arrays via photolithography." This invention provides a novel electronic device that features a first electrode and a second electrode, with a nano-gap formed between them. Notably, the first electrode, the second electrode, and the gap are located within the same layer of the device. Additionally, a two-dimensional layer of graphene may cover the gap, enhancing the device's functionality.

Career Highlights

Leela is currently affiliated with Wayne State University, where she continues to advance her research and development in electronic devices. Her work has garnered attention for its potential applications in various technological fields.

Collaborations

Leela collaborates with Nirul Masurkar, who is also a notable figure in her research endeavors.

Conclusion

Leela Mohana Reddy Arava's innovative work in electronic device fabrication showcases her expertise and commitment to advancing technology. Her contributions are paving the way for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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