Vista, CA, United States of America

Lee Arthur Senecal



Average Co-Inventor Count = 5.8

ph-index = 3

Forward Citations = 66(Granted Patents)


Company Filing History:


Years Active: 2003-2008

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5 patents (USPTO):Explore Patents

Title: Lee Arthur Senecal: Innovator in Organosilane Stabilization

Introduction

Lee Arthur Senecal is a notable inventor based in Vista, California. He has made significant contributions to the field of organosilanes, holding a total of 5 patents. His work focuses on enhancing the stability and performance of silicon-based materials, which are crucial in various technological applications.

Latest Patents

Senecal's latest patents include innovative processes aimed at improving the stability of nitrogen-containing and oxygen-containing organosilanes. One of his key inventions is a method for stabilizing these organosilanes against acid-catalyzed decomposition. This process utilizes weakly basic ion-exchange resins to scavenge harmful anions or acids, thereby prolonging the shelf-life of materials used in semiconductor processing. Another significant patent involves the deposition of porous silicon oxide-based films through a sol-gel approach. This method incorporates a purified nonionic surfactant and ionic or amine additives, resulting in films with a dielectric constant of less than 2.5, which are essential for advanced electronic applications.

Career Highlights

Throughout his career, Senecal has worked with prominent companies such as Air Products and Chemicals, Inc. and Applied Materials, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in material science.

Collaborations

Senecal has collaborated with notable colleagues, including Robert Parkash Mandal and Alexandros T Demos. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Lee Arthur Senecal's contributions to the field of organosilanes demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material stability and performance, making him a valuable figure in the realm of technological advancements.

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