Lawrence J Myland

Title: Innovations by Lawrence J Myland

Introduction

Lawrence J Myland is a notable inventor based in West Chester, Pennsylvania. He has made significant contributions to the field of drying technologies, particularly in the semiconductor industry. With a total of two patents to his name, Myland's work focuses on innovative methods and apparatuses for drying substrates.

Latest Patents

Myland's latest patents include a method for capillary drying of substrates. This inventive apparatus comprises an object support member designed to support at least one substrate in a process tank. The process tank features one or more support sections made of capillary material. The method involves removing liquid from a wet substrate by contacting it with capillary material. Another aspect of his invention details a method for drying substrates by submerging them in a liquid and then supplying a drying vapor above the liquid level. This process effectively removes a major portion of liquid from the substrate surface. Additionally, he has developed a method for drying semiconductor wafers by introducing a polar organic compound in liquid form into a process chamber, allowing it to evaporate and form a drying vapor.

Career Highlights

Lawrence J Myland is currently associated with Akrion, LLC, where he continues to innovate in the field of drying technologies. His work has been instrumental in enhancing the efficiency of drying processes, particularly for semiconductor substrates.

Collaborations

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Conclusion

Lawrence J Myland's contributions to drying technologies have paved the way for advancements in the semiconductor industry. His innovative methods and apparatuses demonstrate his commitment to improving substrate drying processes.