Bengaluru, India

Lavanya Gowlla

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Capital One Services, LLC. Active years: 2025-2026.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 7.5

ph-index = 1


Company Filing History:


Years Active: 2025-2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Lavanya Gowlla: Innovator in Resource Relevance Prediction

Introduction

Lavanya Gowlla is a prominent inventor based in Bengaluru, India. She has made significant contributions to the field of technology, particularly in the area of predicting the relevance of resources to search queries. Her innovative work has the potential to enhance the efficiency of information retrieval systems.

Latest Patents

Lavanya holds a patent titled "Predicting relevance of resources to search queries - Systems and methods for predicting relevance of resources to search queries." This patent describes a system that receives a search query and identifies relevant resources from a database. The system extracts hyperlinks from messages related to the search query and inputs them into a model to generate predictions of relevance. Ultimately, it determines an overall relevance score for the resources based on these predictions. Lavanya has 1 patent to her name.

Career Highlights

Currently, Lavanya is employed at Capital One Services, LLC, where she applies her expertise in developing innovative solutions. Her work focuses on improving search query relevance, which is crucial for enhancing user experience in digital platforms.

Collaborations

Lavanya collaborates with talented professionals such as Lavanya Raja and Puneet Goyal, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Lavanya Gowlla is a trailblazer in the field of resource relevance prediction, with her patent showcasing her innovative spirit. Her contributions are paving the way for advancements in search technology, making information retrieval more effective and user-friendly.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…