Laurl Johnson

Title: Laurl Johnson: Innovator in Photoresist Removal Solutions

Introduction

Laurl Johnson is a notable inventor based in Greenfield, Indiana, recognized for his contributions to the field of chemical engineering. He holds a patent that addresses the challenges associated with the removal of photoresists, which are critical in various manufacturing processes.

Latest Patents

Johnson's patent, titled "Dynamic multi-purpose compositions for the removal of photoresists and method for its use," presents improved dry stripper solutions. These solutions are designed to effectively remove one, two, or more photoresist layers from substrates. The innovative stripper solutions consist of dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, along with a secondary solvent and less than about 3 wt. % water. This patent not only enhances the efficiency of photoresist removal but also provides methods for the preparation and application of these improved solutions.

Career Highlights

Laurl Johnson is currently employed at Dynaloy, LLC, where he continues to develop innovative solutions in the chemical sector. His work has significantly impacted the industry, particularly in the realm of photoresist management.

Collaborations

Johnson collaborates with talented professionals, including Michael Tod Phenis and Raymond Chan, who contribute to the advancement of their projects and innovations.

Conclusion

Laurl Johnson's work exemplifies the spirit of innovation in the field of chemical engineering, particularly through his patented solutions for photoresist removal. His contributions continue to influence the industry positively.