New London, MO, United States of America

Larry Forbis



 

Average Co-Inventor Count = 4.2

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2011-2016

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4 patents (USPTO):Explore Patents

Title: Larry Forbis: Innovator in Manufacturing Processes

Introduction

Larry Forbis is a notable inventor based in New London, MO (US). He has made significant contributions to the field of manufacturing processes, particularly in the development of thick film resistive devices. With a total of 4 patents to his name, Forbis continues to push the boundaries of innovation in his industry.

Latest Patents

One of Larry Forbis's latest patents focuses on reduced cycle time manufacturing processes for thick film resistive devices. This innovative process involves forming a dielectric layer onto a substrate, target, or adjacent functional layer. The dielectric layer, in one form, defines a single layer of dielectric tape. The dielectric tape is laminated to the substrate, target, or adjacent functional layer through a single predetermined cycle of pressure, temperature, and time. Following this, a resistive layer is formed on the dielectric layer, and a protective layer is applied over the resistive layer. This method enhances efficiency and effectiveness in the production of resistive devices such as load resistors and heaters.

Career Highlights

Larry Forbis is currently employed at Watlow Electric Manufacturing Company, where he applies his expertise in manufacturing processes. His work has been instrumental in advancing the company's capabilities in producing high-quality resistive devices.

Collaborations

Throughout his career, Larry has collaborated with talented individuals such as Angie Privett and Roger Brummell. These partnerships have contributed to the successful development of innovative manufacturing solutions.

Conclusion

Larry Forbis is a distinguished inventor whose work in manufacturing processes has made a significant impact in the field. His innovative approaches and collaborations continue to drive advancements in thick film resistive devices.

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