Larry E Stillwagon

Title: Larry E Stillwagon: Innovator in Plasma Technology

Introduction

Larry E Stillwagon is a notable inventor based in Summit, NJ (US). He has made significant contributions to the field of plasma technology, particularly through his innovative patent. His work has implications in various industries, showcasing the importance of advancements in material science.

Latest Patents

Larry E Stillwagon holds a patent for a method involving gas functionalized plasma developed layers. This patent describes a process where a resist is formed by the sorption of an inorganic-containing gas into an organic material. The development of the resist occurs through exposure to a plasma, such as oxygen reactive ion etching, which forms a protective compound selectively in the resist. The selected regions can be defined by patterning radiation of various types, including visible, ultraviolet, electron beam, and ion beam. In an alternate embodiment, the selected regions are defined by an overlying resist, with the gas sorption protecting the underlying layer in a bilevel resist. The protective compound can safeguard the organic resist layer during the etching of an underlying inorganic layer, such as metal, silicide, oxide, or nitride.

Career Highlights

Larry E Stillwagon has had a distinguished career, primarily working at AT&T Bell Laboratories. His role at this prestigious institution has allowed him to engage in cutting-edge research and development, contributing to advancements in technology and materials.

Collaborations

Some of his notable coworkers include Gary N Taylor and Thirumalai N Venkatesan. Their collaborative efforts have further enriched the research environment at AT&T Bell Laboratories.

Conclusion

Larry E Stillwagon's contributions to plasma technology through his innovative patent demonstrate his expertise and commitment to advancing material science. His work continues to influence various applications, highlighting the significance of innovation in today's technological landscape.