Berkeley, CA, United States of America

Larry D Hartsough

This inventor holds 1 USPTO granted patent. Top assignee: Varian Associates, Inc.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Larry D Hartsough. Retrieved from https://idiyas.com/inventor/larry-d-hartsough-zztsoil5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Innovations of Larry D Hartsough in Sputtering Technology

Introduction

Larry D Hartsough is a notable inventor based in Berkeley, California, recognized for his contributions to sputtering technology. He holds a patent for a unique sputtering apparatus that enhances the efficiency and quality of film deposition on substrates. His work has significant implications in various fields, including materials science and semiconductor manufacturing.

Latest Patents

Hartsough's most recent patent is titled "Sputtering apparatus having a rotating magnet array." This innovative magnetron sputter apparatus features a rotatable, generally heart-shaped, closed-loop magnet array positioned behind the target and in front of two separately driven stationary electromagnets. The design is optimized to produce sputtered films on planar substrates, ensuring desired characteristics such as uniform thickness, excellent step coverage, and effective via filling. The heart-shaped array's unique geometry, including a flattened tip and concave cusps, contributes to improved target utilization and film quality.

Career Highlights

Larry D Hartsough has made significant strides in his career, particularly during his tenure at Varian Associates, Inc. His expertise in sputtering technology has positioned him as a key figure in the development of advanced manufacturing processes. His innovative approach has led to improvements in the efficiency and effectiveness of sputtering techniques, benefiting various industries.

Collaborations

Hartsough has collaborated with several professionals in his field, including his coworker David J Harra. Their combined efforts have contributed to advancements in sputtering technology and have fostered a collaborative environment that encourages innovation.

Conclusion

Larry D Hartsough's contributions to sputtering technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of efficient manufacturing processes, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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