The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 1995
Filed:
Apr. 14, 1993
David J Harra, San Francisco, CA (US);
Larry D Hartsough, Berkley, CA (US);
Varian Associates, Inc., Palo Alto, CA (US);
Abstract
A magnetron sputter apparatus is disclosed which includes a rotatable generally heart-shaped, closed-loop magnet array behind the target and in front of a pair of separately driven stationary electromagnets. The apparatus is optimized to produce a sputtered film on a planar substrate having desired film characteristics such as uniformity of thickness, good step coverage, and good via filling and efficient utilization of the target. The shape of the generally heart-shaped array includes a flattened tip forming an arc of a circle centered on the axis of rotation and concave cusps in the lobes of the heart-shape. The electromagnets are used to increase target utilization at its center and to compensate for the change in shape of the target and distance from the target to the substrate with depletion.