Larry A Dworkin

Title: Larry A Dworkin: Innovator in Semiconductor Processing

Introduction

Larry A Dworkin is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his innovative approaches. His work primarily focuses on methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Larry's latest patents is titled "Method of eliminating photoresist poisoning in damascene applications." This patent describes a method for processing a substrate by treating a surface of a dielectric layer that comprises silicon and carbon. The process involves exposing the dielectric layer to a plasma of an inert gas and subsequently depositing a photoresist on the treated layer. The dielectric layer may consist of multiple layers, including a first layer with silicon, carbon, and nitrogen, a second layer of nitrogen-free silicon and carbon, and a third layer comprising silicon, oxygen, and carbon.

Career Highlights

Larry A Dworkin is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to develop and refine innovative techniques that are crucial for modern semiconductor fabrication.

Collaborations

Throughout his career, Larry has collaborated with several talented individuals, including Ping Xu and Li-Qun Xia. These collaborations have contributed to the advancement of technologies in the semiconductor field.

Conclusion

Larry A Dworkin's contributions to semiconductor processing through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.