Company Filing History:

9 out of 13,684

Applied Materials, Inc.

patents

2 out of 15,458

University of California

patents

Years Active: 2018-2023

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. D998575 - Collimator for use in a physical vapor deposition (PVD) chamber (2023-09-12),

2. D997111 - Collimator for use in a physical vapor deposition (PVD) chamber (2023-08-29),

3. 11527437 - Methods and apparatus for intermixing layer for enhanced metal reflow (2022-12-13),

4. 11492699 - Substrate temperature non-uniformity reduction over target life using spacing compensation (2022-11-08),

5. 11315771 - Methods and apparatus for processing a substrate (2022-04-26),

6. 11289329 - Methods and apparatus for filling a feature disposed in a substrate (2022-03-29),

7. 11222816 - Methods and apparatus for semi-dynamic bottom up reflow (2022-01-11),

8. 11152608 - Modified silicon particle electrodes and methods (2021-10-19),

9. D859333 - Collimator for a physical vapor deposition chamber (2019-09-10),

10. D858468 - Collimator for a physical vapor deposition chamber (2019-09-03),

11. 10084184 - Conformal coating of nano-porous material with group IV semiconductor using nanoparticle ink (2018-09-25),

Title: The Innovative Mind of Lanlan Zhong - Revolutionizing PVD Technology

Introduction: Lanlan Zhong, a brilliant inventor based in Santa Clara, CA, has left an indelible mark in the realm of Physical Vapor Deposition (PVD) technology with his remarkable contributions. With 11 patents to his name, Zhong's pioneering work has significantly advanced the field of thin film deposition.

Latest Patents: Among Lanlan Zhong's latest patents is the groundbreaking 'Collimator for use in a physical vapor deposition (PVD) chamber,' showcasing his expertise in optimizing PVD processes for enhanced efficiency and precision.

Career Highlights: Lanlan Zhong has garnered invaluable experience and expertise through his tenure at prestigious institutions such as Applied Materials, Inc. and the University of California. His innovative solutions have been instrumental in driving advancements in PVD technology, positioning him as a notable figure in the industry.

Collaborations: Zhong's collaborative efforts with accomplished individuals like Fuhong Zhang and Martin Lee Riker have further enriched his innovative journey. Together, they have combined their unique skill sets to push the boundaries of PVD technology and pave the way for cutting-edge solutions.

Conclusion: Lanlan Zhong's relentless pursuit of innovation and his transformative contributions to PVD technology underscore his status as a visionary inventor. His inventive spirit continues to inspire advancements in thin film deposition, making him a key figure in the landscape of technological innovation.

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