This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Lance Van Elsen and Plasma Processing Innovation.
Introduction
Lance Van Elsen is an inventor associated with Chaska, Minnesota, and Tokyo Electron Limited. His patent work includes a plasma-processing method and apparatus designed to direct plasma toward a wafer.
Latest Patents
The provided information identifies one patent for Van Elsen: “Plasma processing method and apparatus.” The disclosed apparatus includes a plasma-generation source and a nozzle that directs a plasma stream toward a wafer inside a plasma chamber. An outer annulus surrounds the nozzle above the wafer, while a gas exhaust positioned between the nozzle and annulus connects to a vacuum pump. This arrangement describes a system for managing plasma delivery and gas exhaust during wafer processing. Van Elsen is credited with 1 patent in the information provided.
Career Highlights
Van Elsen’s listed patent reflects work in semiconductor manufacturing technology, particularly plasma processing. The information provided associates him with Tokyo Electron Limited, a company active in semiconductor production equipment.
Collaborations
Jeffrey Lauerhaas is identified as Van Elsen’s coworker. The available details do not specify their particular projects or contributions together.
Conclusion
Lance Van Elsen’s listed invention addresses plasma delivery and exhaust management in wafer processing, highlighting his connection to semiconductor manufacturing innovation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile