This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
**Title: Inventor Profile: Lan Hai Wang**
Introduction
Lan Hai Wang is an esteemed inventor based in Zhubei, Taiwan, recognized for his innovative contributions in the field of thin film deposition technology. With one patent to his name, his work reflects a significant advancement in the methods and apparatus used for film deposition, particularly in semiconductor manufacturing.
Latest Patents
The patent authored by Lan Hai Wang is titled "Thin Film Deposition Apparatus with Multi Chamber Design and Film Deposition Methods." This groundbreaking invention presents a multi-chamber thin film deposition apparatus designed to enhance the uniformity of film thickness on substrates. Each chamber features a three-dimensional gas delivery system that effectively directs process gases both downward and laterally towards the substrate. Central to its design is an exhaust port located underneath the substrate, which ensures an even gas flow distribution around the substrate edges. This innovative approach results in uniform film thickness on both the front and back surfaces of the substrate, extending inward to a consistent distance along the periphery of the backside.
Career Highlights
Lan Hai Wang is employed at Taiwan Semiconductor Manufacturing Company, a leading firm in the semiconductor industry known for its pioneering technologies. His expertise in thin film deposition has positioned him as a valuable asset within the company.
Collaborations
Throughout his career, Lan has collaborated with talented coworkers, including Ding-I Liu and Si-Wen Liao. These partnerships have undoubtedly enriched the innovation process and facilitated advancements in their respective projects.
Conclusion
Lan Hai Wang's innovative work in thin film deposition reflects his commitment to enhancing technology within the semiconductor industry. As his patent demonstrates, his contributions are not only significant but also serve to advance the state of manufacturing processes. As advancements in technology continue to evolve, the impact of inventors like Lan Hai Wang will remain a key driver in this dynamic field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile