Lalit Shokeen

Title: **Lalit Shokeen: Innovator in Etching Technologies**

Introduction

Lalit Shokeen, an accomplished inventor based in Clifton Park, NY, has made significant strides in the field of microelectronics with his innovative approach to etching technologies. With a background of extensive experience and a keen eye for detail, he has played a vital role in the advancement of semiconductor manufacturing processes.

Latest Patents

Lalit Shokeen holds one notable patent titled "Hard mask etch and dielectric etch aware overlap for via and metal layers." This patent provides a method and apparatus for generating final compensation tables crucial for dielectric and hard mask etching processes. The invention outlines an innovative approach that includes performing overlap pattern classification on a wafer, calibrating etch biases, and comparing critical dimensions of various layers against set criteria. The resulting process optimizes performance in manufacturing, thereby enhancing the efficiency and effectiveness of semiconductor devices.

Career Highlights

Lalit currently works at GlobalFoundries Inc., a leading semiconductor manufacturer known for its cutting-edge technology and innovation. His role involves developing methods that facilitate better etching processes, greatly influencing production outcomes and quality in the industry.

Collaborations

Throughout his career, Lalit has collaborated with talented colleagues such as Guo Xiang Ning and Yuping Ren. These partnerships have contributed to the rich exchange of ideas and expertise, fostering an environment of creativity and technological advancement.

Conclusion

Lalit Shokeen exemplifies the spirit of innovation within the semiconductor industry. His contributions, particularly in the area of etching processes, are paving the way for more efficient manufacturing techniques. As he continues to push the boundaries of technology, Lalit remains a key player in advancing microelectronics and enhancing the future of semiconductor production.