Kyung Il Park

Title: The Innovative Journey of Kyung Il Park

Introduction

Kyung Il Park, based in Seongnam-si, South Korea, is an inventive mind known for his significant contributions to the field of semiconductor technology. With four patents to his name, his work primarily focuses on chemical mechanical polishing slurry compositions that play a critical role in the manufacturing of semiconductor devices.

Latest Patents

Among his latest patents, the first presents a chemical mechanical polishing slurry composition specifically designed for polishing polycrystalline silicon films. This innovative composition consists of a solvent, a polishing agent, a pH adjuster, and various additives. It is notable for its high polishing speed and selective polishing capabilities, making it highly effective for processes involving polycrystalline silicon films in semiconductor wafers.

The second important patent falls under the category of a chemical mechanical polishing slurry composition and a manufacturing method for semiconductors. This particular composition includes a polishing agent, an amine-based polishing activator, and a roughness adjusting agent, allowing for modifications in the roughness of tungsten and silicon oxide films. It notably reduces particle presence on wafer surfaces post-polishing, thereby mitigating potential defects.

Career Highlights

Kyung Il Park's professional journey spans key positions in renowned companies, including Samsung SDI Co., Inc. His work in these environments has sharpened his expertise and nurtured innovative ideas that contribute to advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Kyung Il Park has collaborated with talented individuals such as Seok Joo Kim and Hyeong Ju Lee. These collaborations have enriched his research and fueled the development of advanced polishing slurry technologies.

Conclusion

Kyung Il Park exemplifies the spirit of innovation within the semiconductor industry. His patents not only enhance the efficiency of semiconductor manufacturing but also pave the way for future advancements. Through his ongoing contributions, he remains a noteworthy inventor in the realm of chemical mechanical polishing technologies.