This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Kyung Hoon Kim: Plasma Processing Invention
Introduction
Kyung Hoon Kim is an inventor based in Santa Clara, California, and works at Applied Materials, Inc. His patent work addresses plasma processing, including techniques for controlling ion energy distributions.
Latest Patents
Kim is associated with 1 patent: “Pulsed Voltage Waveform with Binary Pulses for Biasing of Plasma—Methods and Apparatus for Forming a Discrete Multimodal Ion Energy Distribution Function (IEDF)-Containing Plasma.”
The described method generates two bursts of voltage pulses in different pulsing states. Each burst contains multiple pulses, and the first, second, third, and fourth pulse voltages are all different. This approach is designed to form a plasma with a discrete, multimodal ion energy distribution.
Career Highlights
Kim’s listed work at Applied Materials, Inc. connects his inventive activity with the development of plasma-processing methods and apparatus. The patent describes a pulse-based approach to shaping ion energy distributions.
Collaborations
The patent’s listed collaborators include Shreeram Jyoti Dash and Takumi Yanagawa.
Conclusion
Kyung Hoon Kim’s patent focuses on using distinct voltage pulses to control plasma characteristics, reflecting his contribution to plasma-processing innovation at Applied Materials, Inc.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile