Kyuman Hwang

Title: Kyuman Hwang: Innovator in Semiconductor Technology

Introduction

Kyuman Hwang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative designs and methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Hwang's latest patents include a three-dimensional semiconductor device and a method of fabricating the same. This invention provides a novel approach to semiconductor design, featuring a first active region on a substrate with a plurality of lower channel patterns and lower source/drain patterns arranged alternately. Additionally, it includes a second active region on the first active region, which consists of upper channel patterns and upper source/drain patterns. The design incorporates gate electrodes that enhance the functionality of the device. Another notable patent involves semiconductor devices that include a capping layer, which features first and second active regions on a substrate, along with an element isolation layer and a unique dummy gate line structure.

Career Highlights

Kyuman Hwang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His role at Samsung allows him to work on cutting-edge semiconductor technologies that are crucial for modern electronic devices.

Collaborations

Hwang collaborates with talented coworkers, including Sungil Park and Jae Hyun Park. Their combined expertise contributes to the innovative projects at Samsung Electronics.

Conclusion

Kyuman Hwang is a key figure in semiconductor innovation, with a focus on developing advanced technologies that push the boundaries of electronic device performance. His contributions are vital to the ongoing evolution of the semiconductor industry.