Kyu Jin Choi

Title: Kyu Jin Choi: Innovator in Substrate Processing Technologies

Introduction

Kyu Jin Choi is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of substrate processing, particularly in the development of methods and apparatuses for improving thin film quality. With a total of 3 patents to his name, Choi continues to push the boundaries of innovation in his industry.

Latest Patents

One of Choi's latest patents is titled "Method for removing impurities in thin film and substrate processing apparatus." This inventive concept focuses on a method for effectively removing impurities from thin films. The process involves providing a substrate with a thin film in a process chamber, supplying a first gas that reacts with the impurities, and then exhausting the coupled product after depressurizing the chamber. The method also includes curing the thin film with a second gas and removing any remaining gas from the chamber.

Another significant patent is the "Batch-type substrate processing apparatus and operation method thereof." This invention features a vertical reaction tube designed to accommodate a substrate boat with multiple stacked substrates. It includes a deposition gas supply unit, a heater for thermal energy, and an adhesion layer on the inner wall of the reaction tube to manage deposition by-products.

Career Highlights

Kyu Jin Choi is currently employed at Eugene Technology Co., Ltd., where he applies his expertise in substrate processing technologies. His work has been instrumental in advancing the capabilities of the company's products and services.

Collaborations

Choi collaborates with talented individuals such as Cha Young Yoo and Sung Tae Je, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Kyu Jin Choi is a prominent figure in the field of substrate processing, with a focus on improving thin film technologies. His patents reflect his commitment to innovation and excellence in his work.