This inventor holds 1 USPTO granted patent. Top assignee: Pohang University of Science and Technology Foundation. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: The Innovative Contributions of Kyu Hwang Won
Introduction
Kyu Hwang Won is a notable inventor based in Pohang, South Korea. He has made significant contributions to the field of material science, particularly in the area of surface modification. His innovative approach has led to advancements that could have wide-ranging applications in various industries.
Latest Patents
Kyu Hwang Won holds a patent for a method titled "X-ray induced wettability modification." This patent discloses a method for modifying the wettability of a surface of an inorganic material. The process involves preparing an inorganic material with a surface and charging that surface with positive surface charges obtained from photoelectron-emission through X-ray irradiation. This innovative technique has the potential to enhance the functionality of inorganic materials in various applications.
Career Highlights
Kyu Hwang Won is associated with the Postech Academy-Industry Foundation, where he continues to explore and develop new technologies. His work is characterized by a commitment to advancing the understanding of material properties and their applications. His research has garnered attention for its practical implications in improving material performance.
Collaborations
Kyu Hwang Won has collaborated with esteemed colleagues such as Yong Bum Kwon and Byung Mook Weon. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Kyu Hwang Won's contributions to the field of material science, particularly through his patented method for wettability modification, highlight his role as an influential inventor. His work at the Postech Academy-Industry Foundation and collaborations with other researchers further emphasize his commitment to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile