The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2013
Filed:
Jan. 22, 2009
Applicants:
Yong Bum Kwon, Pohang, KR;
Byung Mook Weon, Pohang, KR;
Kyu Hwang Won, Pohang, KR;
Jung Ho Je, Pohang, KR;
Inventors:
Yong Bum Kwon, Pohang, KR;
Byung Mook Weon, Pohang, KR;
Kyu Hwang Won, Pohang, KR;
Jung Ho Je, Pohang, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a method for modifying wettability of a surface of an inorganic material, the method comprising the steps of: preparing an inorganic material with a surface; and charging the surface of the inorganic material with positive surface charges obtained from photoelectron-emission by an X-ray irradiation to the surface of the inorganic material.
Kwon, Yong. (2013). X-ray induced wettability modification (U.S. Patent No. 8497000). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8497000
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile