Tokyo, Japan

Kyosuke Ishikawa

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignees: Shoei Co., Ltd., Shoei Limited Co.. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyosuke Ishikawa. Retrieved from https://idiyas.com/inventor/kyosuke-ishikawa-29x0sy6p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3

 

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2026

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3 patents (USPTO):Explore Patents

Title: Kyosuke Ishikawa: Innovator in Helmet Technology

Introduction

Kyosuke Ishikawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of helmet technology, particularly focusing on airflow control mechanisms. His innovative designs aim to enhance safety and comfort for users.

Latest Patents

Ishikawa holds a patent for a "Helmet airflow control member and helmet." This invention features a plate-like main body that is arranged on a helmet shell. The design includes a main body rear surface that covers part of the shell's outer surface, along with at least one passage formation portion. The unique structure allows for improved airflow, enhancing the overall functionality of the helmet.

Career Highlights

Kyosuke Ishikawa has been associated with Shoei Limited Co., a company renowned for its high-quality helmets. His work at Shoei has allowed him to focus on innovative designs that prioritize user safety and comfort. His patent reflects his commitment to advancing helmet technology.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Kyosuke Ishikawa is a pioneering inventor whose work in helmet technology has made a significant impact. His innovative designs continue to influence the industry, ensuring safer and more comfortable experiences for users.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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