The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

Jun. 08, 2021
Applicant:

Shoei Co., Ltd., Tokyo, JP;

Inventor:

Kyosuke Ishikawa, Tokyo, JP;

Assignee:

SHOEI CO., LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A42B 3/04 (2006.01); A42B 3/06 (2006.01); A42B 3/12 (2006.01);
U.S. Cl.
CPC ...
A42B 3/06 (2013.01); A42B 3/0493 (2013.01); A42B 3/12 (2013.01);
Abstract

A helmet includes a helmet body and right and left cheek pads arranged inside the helmet body. The cheek pads each include a first bottom portion including a first outer surface located downward from a lower edge of the helmet body and a second bottom portion including a second outer surface located rearward from the first bottom portion. The first outer surface and the second outer surface form a wearing opening of the helmet and are negative pressure generating surfaces configured to generate a downforce acting on the helmet by having the first outer surface located downward from the second outer surface. The first bottom portion and the second bottom portion are resilient so as to enlarge the wearing opening when receiving force for enlarging the wearing opening and reduce the wearing opening in size when the force is removed.


Find Patent Forward Citations

Ishikawa, Kyosuke. (2026). Helmet and cheek pad (U.S. Patent No. 12696947). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12696947

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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