Company Filing History:
Years Active: 2006-2010
Title: The Innovative Contributions of Kyong-Hee Joo
Introduction
Kyong-Hee Joo is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of non-volatile memory devices, holding a total of 4 patents. His work has been instrumental in advancing technology in this area, particularly through his innovative methods of fabrication.
Latest Patents
Kyong-Hee Joo's latest patents include groundbreaking methods for fabricating non-volatile memory devices that incorporate nanocrystals. One of his notable inventions describes a process where a tunnel dielectric layer is formed on a semiconductor substrate. This substrate is then subjected to an atomic layer deposition (ALD) process to create nanocrystals on the tunnel dielectric layer. Following this, the semiconductor substrate is removed from the ALD chamber, and a control gate dielectric layer is formed on it, culminating in the creation of a control gate electrode. Another significant patent involves a method of forming a thin layer with a desired composition. In this method, a source gas is introduced onto a substrate, which is then chemisorbed. A plasma is generated to convert the chemisorbed gas into a thin layer with the desired composition, which can be either stoichiometrical or non-stoichiometrical.
Career Highlights
Kyong-Hee Joo is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work has not only contributed to the company's advancements but has also had a broader impact on the industry.
Collaborations
Some of his notable coworkers include In-Seok Yeo and Seung-hyun Lim, who have collaborated with him on various projects, further enhancing the innovative environment at Samsung Electronics.
Conclusion
Kyong-Hee Joo's contributions to the field of non-volatile memory devices exemplify the spirit of innovation. His patents reflect a deep understanding of technology and a commitment to advancing the industry. His work continues to inspire future developments in semiconductor technology.