Utsunomiya, Japan

Kyohei Ishikawa

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyohei Ishikawa. Retrieved from https://idiyas.com/inventor/kyohei-ishikawa-3iwbouda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: Kyohei Ishikawa: Innovator in Optical Devices

Introduction

Kyohei Ishikawa is a notable inventor based in Utsunomiya, Japan. He has made significant contributions to the field of optical devices, holding a total of 2 patents. His work focuses on innovative manufacturing methods that enhance the performance of optical components.

Latest Patents

Ishikawa's latest patents include an optical device and its manufacturing method. This optical device features a sequence of layers, starting with a surface formed of a metal oxide. It includes a samarium oxide-containing layer in contact with the metal oxide surface, followed by a magnesium fluoride-containing layer. This design aims to suppress optical absorption that can occur during the high-rate sputter deposition of the magnesium fluoride layer on the metal oxide surface.

Career Highlights

Kyohei Ishikawa is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical technologies. His work at Canon has allowed him to explore and develop advanced optical devices that have practical applications in various industries.

Collaborations

Ishikawa has collaborated with Hideo Akiba, a fellow innovator in the field. Their partnership has contributed to the development of cutting-edge optical technologies.

Conclusion

Kyohei Ishikawa's contributions to optical devices demonstrate his commitment to innovation and excellence in technology. His patents reflect a deep understanding of materials and manufacturing processes that enhance optical performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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