This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Kyo Hatakeyama: Innovator in Resist Composition Technology
Introduction
Kyo Hatakeyama is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist composition technology, which is essential in various applications, including semiconductor manufacturing. His innovative work has led to the development of a unique resist composition that enhances the efficiency of pattern formation.
Latest Patents
Kyo Hatakeyama holds a patent for a resist composition, method of forming a resist pattern, compound, and acid diffusion control agent. This resist composition generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid. The composition includes a base component that alters its solubility in response to acid, along with a compound represented by a specific general formula. This innovation is crucial for improving the precision and effectiveness of resist patterns in various technological applications.
Career Highlights
Kyo Hatakeyama is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the electronics industry. His work at the company has positioned him as a key player in the development of innovative materials that support the evolving needs of semiconductor technology.
Collaborations
Kyo Hatakeyama has collaborated with talented coworkers, including Takashi Nagamine and Daichi Takaki. Their combined expertise has contributed to the successful development of advanced resist compositions and related technologies.
Conclusion
Kyo Hatakeyama's contributions to resist composition technology exemplify the importance of innovation in the semiconductor industry. His patent and collaborative efforts highlight the ongoing advancements in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile