Bear, DE, United States of America

Kyle W David

This inventor holds 1 USPTO granted patent. Top assignee: Rodel Holdings, Inc.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyle W David. Retrieved from https://idiyas.com/inventor/kyle-w-david-glfrblt7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovations by Inventor Kyle W David

Introduction

Kyle W David is an accomplished inventor based in Bear, Delaware. He has made significant contributions to the field of polishing pad technology. His innovative approach has led to the development of a unique method that enhances the functionality of polishing pads used in various applications.

Latest Patents

Kyle W David holds a patent for a "Method of fabricating a polishing pad having an optical window." This invention involves a process where a polishing layer is applied over a substantially optically transparent backing layer. The method includes forming an optical window by removing a portion of the polishing layer while ensuring that the backing layer remains intact. This design prevents liquids, such as aqueous polishing slurries, from leaking through the optical window, thereby protecting the underlying polishing apparatus.

Career Highlights

Kyle W David is associated with Rodel Holdings, Inc., a company known for its advancements in semiconductor manufacturing technologies. His work at Rodel Holdings has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for excellence in the industry.

Collaborations

Due to space constraints, the details of collaborations will not be included.

Conclusion

Kyle W David's contributions to polishing pad technology exemplify the impact of innovation in manufacturing processes. His patented method not only enhances the functionality of polishing pads but also demonstrates his commitment to advancing technology in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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