Kyle Jordan Blakeney

Title: The Innovative Contributions of Kyle Jordan Blakeney

Introduction

Kyle Jordan Blakeney is a prominent inventor based in Fremont, CA (US). She has made significant contributions to the field of semiconductor technology, particularly in the deposition of molybdenum-containing films. Her work is crucial for advancing the capabilities of semiconductor substrates.

Latest Patents

Kyle holds a patent for "Precursors for deposition of molybdenum-containing films." This patent describes a method for depositing molybdenum-containing films on semiconductor substrates using reactions of molybdenum-containing precursors in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes. The innovation allows for the deposition of molybdenum metal films with minimal incorporation of carbon and nitrogen. Additionally, the films can be deposited using fluorine-free precursors in the presence of exposed silicon-containing layers without the need for etch stop layers. The precursor compounds include molybdenum, halogens that bond with molybdenum, and organic ligands containing elements such as nitrogen, oxygen, or sulfur.

Career Highlights

Kyle Jordan Blakeney is currently employed at Lam Research Corporation, where she continues to push the boundaries of semiconductor technology. Her expertise in the field has led to advancements that are essential for the development of next-generation electronic devices.

Collaborations

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Conclusion

Kyle Jordan Blakeney's innovative work in the field of semiconductor technology exemplifies the impact of her contributions to the industry. Her patent on molybdenum-containing films showcases her commitment to advancing technology in meaningful ways.