Kwokshun Cheng

Title: Innovations by Kwokshun Cheng in Filtration Technology.

Introduction

Kwokshun Cheng is an accomplished inventor based in Nashua, NH (US). He has made significant contributions to the field of filtration technology, particularly through his innovative work on acid-resistant filter media. His expertise and dedication to improving filtration methods have led to the development of advanced membranes that enhance liquid purification processes.

Latest Patents

Kwokshun Cheng holds a patent for an acid-resistant filter media. This invention provides membranes that are useful in the filtration of liquids and the removal of various contaminants. The membranes incorporate polyamide components such as Nylon 11 and/or Nylon 12, which exhibit superior acid stability compared to those made from Nylon 6 or Nylon 6,6. The patent also outlines methodologies for manufacturing these membranes, emphasizing their application in filtration and purification.

Career Highlights

Kwokshun Cheng is currently associated with Entegris, Inc., where he continues to innovate in the field of filtration technology. His work has been instrumental in advancing the capabilities of filtration systems, making them more effective in various industrial applications.

Collaborations

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Conclusion

Kwokshun Cheng's contributions to the development of acid-resistant filter media represent a significant advancement in filtration technology. His innovative approach and dedication to improving liquid purification processes have established him as a notable inventor in this field.