Location History:
- Ontario, CA (2005)
- Mississauga, CA (2001 - 2008)
Company Filing History:
2 out of 2 
2 out of 11 
2 out of 2 Years Active: 2001-2008
Title: **Kwok Tang: A Pioneer in Chemical Mechanical Planarization Innovations**
Introduction
Kwok Tang, an inventor based in Mississauga, Canada, has made significant advances in the field of chemical mechanical planarization (CMP) with his groundbreaking inventions. With a total of seven patents to his name, Tang has developed innovative solutions that have the potential to transform processes in the semiconductor industry.
Latest Patents
Kwok Tang's latest patents focus on engineered non-polymeric organic particles designed for chemical mechanical planarization. His first significant invention is an abrasive composition that utilizes composite non-polymeric organic particles, which can widely be used in semiconductor applications. These composite particles contain at least one non-polymeric organic component, alongside at least one differing chemical component. This formulation allows for simplification in the slurry composition when components are integrated into the abrasive particles. The resulting abrasive compositions exhibit efficient polishing rates, excellent selectivity, and superior surface quality for CMP applications.
Tang’s second innovative patent pertains to an abrasive composition comprising non-polymeric organic particles. This formulation is also dedicated to chemical mechanical planarization in the semiconductor industry. The inventive compositions involve soft water mixed with varying percentages of non-polymeric organic particles, oxidizing agents, chelating agents, surfactants, and passivation agents, optimally adjusted at a pH range of 2-12. These compositions are tailored to provide impressive polishing rates and maintain high surface quality when implemented in CMP applications.
Career Highlights
Throughout his career, Kwok Tang has worked with notable companies including Dynea Canada Ltd. and Dynea Chemicals Oy. His experience in these reputed organizations has allowed him to refine his expertise and contribute valuable innovations to the field.
Collaborations
Kwok Tang has collaborated with accomplished professionals in his field, including Guomin Bian and Yuzhuo Li. Their collective efforts have facilitated the development of cutting-edge technologies in CMP, further enhancing the efficacy and quality of semiconductor processes.
Conclusion
Kwok Tang stands out as an influential inventor whose contributions to chemical mechanical planarization are reshaping the semiconductor industry. With several patents reflecting his innovative mindset, Tang's work showcases the importance of advancing technology through dedicated research and collaboration with industry experts. His ongoing legacy is likely to inspire future innovations within the field.